The Combination of Metal Oxides as Oxide Layers for RRAM and Artificial Intelligence (2305.00166v1)

Abstract: Resistive random-access memory (RRAM) is a promising candidate for next-generation memory devices due to its high speed, low power consumption, and excellent scalability. Metal oxides are commonly used as the oxide layer in RRAM devices due to their high dielectric constant and stability. However, to further improve the performance of RRAM devices, recent research has focused on integrating AI. AI can be used to optimize the performance of RRAM devices, while RRAM can also power AI as a hardware accelerator and in neuromorphic computing. This review paper provides an overview of the combination of metal oxides-based RRAM and AI, highlighting recent advances in these two directions. We discuss the use of AI to improve the performance of RRAM devices and the use of RRAM to power AI. Additionally, we address key challenges in the field and provide insights into future research directions